Much of the infrastructure that has facilitated the remarkable advances in electronic and computer technology has been based on advances in electronic materials and devices. Research at Michigan State University in electronic materials and devices includes simulation, design, fabrication, characterization, and applications. State of the art facilities have been established for materials synthesis using physical vapor deposition techniques such as e-beam deposition, sputtering, pulsed laser deposition as well as bulk material synthesis such as solid solutions, powder processing and pulsed electric current sintering. In addition, the group is well recognized for their work in microwave assisted plasma chemical vapor deposition and its use in the growth of single crystalline, polycrystalline and nanocrystalline diamond, diamond like carbon, amorphous carbon, and carbon nanotubes, as well as a variety of carbide and nitride hard coating techniques which utilize microwave and plasma technologies developed in this group. Facilities in the department include semiconductor characterization equipment, and a class 1000 cleanroom for standard lithography processes used in device fabrication and microelectromechanical system (MEMS) development.

Additional research includes the investigation of electronic/structural properties and biocompatibility of nanostructures, the growth mechanisms of carbon nanostructures, amorphous tetrahedral carbon, diamond, nanowires, scanning probe microscopy and nanomanipulation. Synthesis, fabrication and characterization studies of thermoelectric materials. The design, growth, and investigation of compound semiconductors for device applications using in-situ monitoring, is coupled with statistical analysis and advanced modeling techniques.


John Albrecht, Dean Aslam, Jes Asmussen, Virginia Ayres, Qi Hua Fan, Timothy Grotjohn, Tim Hogan, Wen Li, Aljoscha Roch, Thomas Schuelke, Nelson Sepulveda, Chuan Wang, Tom Zimmermann

Courses & Labs:

  • ECE 474: Principles of Electronic Devices (3 credits, Lecture)
  • ECE 476: Electro-Optics (4 credits, Lecture & Lab)
  • ECE 477: Microelectronic Fabrication (3 credits, Lecture & Lab)
  • ECE 870: Introduction to Micro-Electro-Mechanical Systems (3 credits, Lecture)
  • ECE 871: Microsystems Fabrication (3 credits, Lecture)
  • ECE 874: Physical Electronics (3 credits, Lecture)
  • ECE 875: Electronic Devices (3 credits, Lecture)
  • ECE 877: Cleanroom Procedures (3 credits, Lecture & Lab)
  • ECE 931C: Properties of Semiconductors (3 credits, Lecture)

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